Silevo’s Triex cell is based on a breakthrough tunneling junction cell architecture to push the industry to grid parity. The hybrid technology incorporates N-type crystalline silicon substrates to enable good carrier lifetime and low light induced degradation, thin film passivation layers to produce high voltage, and a semiconductor tunneling oxide interface layer for excellent junction quality and temperature coefficient performance.
N-type crystalline substrate
Enables a good carrier lifetime and low light induced degradation.
Thin Film Passivation
Enables high voltage for improved efficiency.
Semiconductor Oxide
Enables excellent junction quality and temperature coefficient performance.


